NGI - Mask aligner

Summary: Conventional optical lithography uses an etched chrome photomask to transfer the required device design into a photo-resist coated substrate. The NGI uses a Karl Suss MJB4 mask aligner for this purpose.

Type: Other

Owner: Faculty of Science and Engineering

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Contact email: ngi-academic-enquiries@manchester.ac.uk

Last modified: 10/02/2021

Link to this document:
https://documents.manchester.ac.uk/display.aspx?DocID=53139

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