NGI Cleanrooms - UHV facility

Summary: The UHV facility has the capability to: exfoliate 2D crystals under ultra-high vacuum conditions; stack multiple crystals to make heterostructures; pattern devices and contacts using in-situ shadow masking; metallise using electron beam and magnetron sputtering; etch and anneal prepared substrates and samples in Ar, O2 and Ar/H2 atmospheres.

Type: Other

Owner: Faculty of Science and Engineering

To view, click on link. To save, right-click and select SelectTarget As

Contact email: ngi-academic-enquiries@manchester.ac.uk

Last modified: 22/02/2021

Link to this document:
https://documents.manchester.ac.uk/display.aspx?DocID=53319

Edit (only Administrators)