NGI - Direct-write optical lithography Summary: Traditional photolithography requires the manufacture of a photomask to define each layer of a device. However, with the exfoliation method used at the NGI to produce 2D material flakes, the size and position of a test sample is impossible to predict. Designing and manufacturing a photomask set to then create a test structure of the appropriate size and position would therefore impose significant delays. The laser-writer removes this obstacle by allowing the device design to be imprinted directly onto a photo-resist coated substrate by scanning with an ultra-violet laser. The laser is controlled by following the design which is encoded into an appropriate data format. Type: Other Owner: Faculty of Science and Engineering   Contact email: ngi-academic-enquiries@manchester.ac.uk Last modified: 10/02/2021 Link to this document: https://documents.manchester.ac.uk/display.aspx?DocID=53138 Edit (only Administrators)