NGI Cleanrooms - Inductively coupled plasma-reactive ion etcher chamber (ICP RIE)

Summary: Detailed overview and technical specifications for the Inductively coupled plasma-reactive ion etcher chamber (ICP RIE) at the National Graphene Institute at The University of Manchester

Type: Other

Owner: Faculty of Science and Engineering

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Contact email: francisco.lopez-royo@manchester.ac.uk

Last modified: 03/12/2020

Link to this document:
https://documents.manchester.ac.uk/display.aspx?DocID=52130

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